LiNbO3 crystals are the most commonly used material for pockel cells, Q-switches and phase modulators, waveguide substrates, surface acoustic wave (SAW) wafers, etc.
Description
Lithium niobate (LiNbO3, LN) crystals doped with iron (Fe:LiNbO3) is an attractive photorefractive material, due to high photorefractive sensitivity, high
electro-optic coefficients and diffraction efficiency, chemomechanical properties. Fe:LiNbO3 crystals are grown by Czochralsky method and available
in large size. Wide range of available dopants and levels enable to adjust material properties for particular applications. What is more, Fe:LiNbO3 crystals
feature ease to handle, low cost, therefore suitable for volume production.
Main features
High electro-optic coefficient (r41=5 pm/V)
High phase conjugation efficiency
Available in large size elements or wafers up to 3”
Customization available upon request
Application examples
Spatial light modulators
Optical switches
Holographic recording
Optical waveguides
Main properties
Chemical formula: Fe:LiNbO3
Crystal structure: Trigonal, 3m
Density: 4,64 g/cm3
Mohs hardness: 5
Transparency range : 0,35 - 5,5 μm
Refractive indices @0,63 μm: ne = 2,20 no = 2,29
Electro-optic coefficients: r22 = 6,8 pm/V r31 = 10 pm/V r33 = 32 pm/V
Dielectric constants: e11 = 85 e33 = 30
LiNbO3 Crystal Specification or or based on clients' requirements | |
Growth Method | Czochralski |
Crystal Structure | Trigonal |
Lattice Constant | a=b=5.148? c=13.863 ? |
Melting Point | 1250℃ |
Curie Temperature | 1140℃ |
Density | 4.64(g/cm3) |
Mohs Hardness | 5(mohs) |
Transmission Wavelength | 0.4-2.9μm |
Refractive Index | no=2.286 ne=2.203 (632.8nm) |
Intensity of Spontaneous Polarization | 50×10C/cm |
Nonlinear Coefficient | d22 = 2.1 d31 = - 4.5 d33 = -0.27 (pmv-1) |
Electro-optic Coefficient | γ13=8.6,γ22=3.4,γ33=30.8,γ51=28.0,(pmv-1) |
Optical Damage Threshold | 250 MW/cm2 @ 1064 nm, 10nsec. |
Transmittance | 370~5000nm >68% |
(632.8nm) | |
Thermal Expansion | //a, 2.0 x 10-6 / K |
//c, 16.7 x 10-6 / K | |
Absorption Loss | @ 1064 nm < 0.1 %/cm |
Material | Domestic or foreign materials are selected based on clients' requests |
Dimension | Equal to or less than ?4″ |
Dimensional Tolerance | Z axis: ±0.3mm |
Surface Quality | 10-5 |
Chamfer | Less than 0.5mm, 45 o±5 o |
Crystal Orientation Accuracy | Z axis: 5′ |
Flatness | v8 (632.8nm) |
Parallelism | <10′ |
Coating | R<0.2%(1064nm) |
Wavefront Distortion | <N4(633nm) |
Extinction Ratio | >400:1(633nm)φ6mm beam |
Package | Class 100 clean bag, Class 1000 super clean room |